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Bulletin of Pure and Applied Sciences- Physics (Started in 1982)
eISSN: 2320-3218
pISSN: 0970-6569
Impact Factor: 6.987 (2018)
DOI: 10.5958/2320-3218
Editor-in-Chief:  Prof. Madan jee,
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Bulletin of Pure and Applied Sciences- Physics (Started in 1982)
Year : 2018, Volume & Issue : Volume-37D, Issue-2 (July-December)
Page No. : 47-49, Article Type : Original Aticle
Article DOI : 10.5958/2320-3218.2018.00009.X (Received on 16.04.2018, Accepted on 24.08.2018)

Patterns in Two Photon Photoemission Images of Light Diffracting Structures in Wave Guiding Transparent Thin Films

Sukhdeo Singh1, Pradeep Kumar Choudhary2, Shartendu Kumar Singh3
Author’s Affiliation : 1Department of Physics, N.N. College, Singhara, Vaishali, Bihar 844126, India. 2Department of Physics, R.D.S. College, Muzaffarpur, Bihar 842002, India. 3Department of Physics, R.S.S. College, Chochaha, Muzaffarpur, Bihar 842001, India.

Corresponding Author : Sukhdeo Singh Department of Physics, N.N. College, Singhara, Vaishali, Bihar 844126, India,
E-Mail:-[email protected]


We have studied the patterns in two photon photoemission images of light diffracting structures in wave guiding transparent thin films. We first determined the wave numbers of guided modes that can be expected in dielectric thin films, then used Fraunhofer diffraction to determine the relative amplitude of modes excited at the periphery of the film where the in-coupling occurred. The evolution of waves in the film was then calculated using Fresnel-Kirchhoff integration, where the diffracting structure served as the aperature and a two dimensional, attenuated Green’s function describes the guided mode fields at the vacuum interface. We used the results from this analysis to compute the photoelectron emission rate, which derived from the complex sum of surface fields and incident light. We studied two photonic structures in an aberration corrected photoemission electron microscopy using two photon excitation and compared the electron micrographs to field based calculations, where we found good agreement.


Photo emission, wave guiding, thin films, guided modes, dielectric, diffraction, Fresnel-Kirchoff integration.
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